Work Activities What are the atomic-scale processes behind light-induced damage?
Light-induced damage presents a challenge in applications of high-power lasers, including semiconductor device manufacturing. For the prevention of damage, it is particularly interesting to identify the changes to materials before any degradation of performance is discernible. The emergence of damage is often attributed to the creation of defects or the enhanced interaction of defect sites with external stimuli. Which defects are crucial in damage processes and how different defect types respond to laser pulses, however, remains unresolved at the atomic scale. In this project, you will address these questions using high-resolution transmission electron microscopy (TEM) with in-situ laser exposure. You will shed light on the atomic-scale mechanisms of defect generation and damage below the threshold for macroscopic changes, and connect material properties to the light-induced damage patterns of nanometer thick layers.
Your role as postdoc
You will perform your research in a collaboration between the Light-Matter Interaction group and the Materials & Surface Science for EUVL group at ARCNL, the Hybrid Nanosystems group at AMOLF, and the semiconductor equipment manufacturing company ASML. With guidance from these project partners, you will develop a research plan to resolve the atomic-scale details of light-induced modifications to thin films in the context of nanolithography and optical metrology. You will operate a state-of-the-art aberration corrected TEM with unique light incoupling and ultrafast time-resolution capabilities. You will have access to thin-film preparation and surface characterization facilities at ARCNL and AMOLF to fabricate thin layers and characterize their composition and structure. With the help of experts in the respective methods, you will grow layers for the TEM experiments and have the option to pre- and post-characterize them with several techniques such as atomic-force microscopy (AFM), optical microscopy, scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), and Raman spectroscopy.
Qualifications - You have a PhD in Physics, Physical Chemistry, or Materials Science and hands-on experience with transmission electron microscopy.
- You are independent and have good project management skills.
- Good verbal and written communication skills (in English) are required.
- A background in light-matter interaction, laser spectroscopy, thin-film growth, or surface science is considered an advantage for the project.
Work environment ARCNL performs fundamental research, focusing on the physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. While the academic setting and research style are geared towards establishing scientific excellence, the topics in ARCNL’s research program are intimately connected with the interests of the industrial partner ASML. The institute is located at Amsterdam Science Park and currently employs about 100 persons of which 65 are ambitious (young) researchers from all over the globe.
www.arcnl.nlWorking conditions The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of 2 years, with a salary in scale 10 (
CAO-OI) and a
range of employment benefits. ARCNL assists any new foreign Postdoc with housing and visa applications and compensates their transport costs and furnishing expenses.
More information? For further information about the position, please contact:
Dr. Roland Bliem
Group leader for Materials and Surface Science for EUV Lithography
E-mail:
r.bliem@arcnl.nl Phone: +31- 20 851 7100
Dr. Wiebke Albrecht
Group leader for Hybrid Nanosystems
E-mail:
W.Albrecht@amolf.nl Phone: +31- 20 754 7100
Prof.dr. Paul Planken
Group leader for Light-Matter Interaction
E-mail:
P.Planken@arcnl.nl Phone: +31- 20 851 7100
Application You can respond to this vacancy online on the ARCNL webpage.
Please send your:
- Resume;
- Motivation why you want to perform the outlined research (max. 1 page).
It is important to us to know why you want to join our team. This means that we will only consider your application if it includes your motivation letter.
Online screening may be part of the selection.Commercial activities in response to this ad are not appreciated.Diversity code ARCNL is highly committed to an inclusive and diverse work environment: we want to develop talent and creativity by bringing together people from different backgrounds and cultures. We recruit and select on the basis of competencies and talents. We strongly encourage anyone with the right qualifications to apply for the vacancy, regardless of age, gender, origin, sexual orientation or physical ability.
Commercial activities in response to this ad are not appreciated.