Work Activities
The EUV-emitting laser-produced plasmas are generated from tin targets carefully shaped (hydrodynamically deformed) by a series of laser “pre-pulses”. The ability to shape & control these tin targets is critical for efficient generation of EUV light for current and future light sources. Such abilities will originate from understanding the driving physical processes.

You will join a team of several PhD students and postdocs and have as an objective to design & execute experiments to understand the fluid dynamic deformation, fragmentation, and vaporization of laser-impacted thin liquid tin targets: what really happens when a laser pulse hits a tin droplet? New fluid dynamics understanding will lead to new capabilities for laser-tailoring targets. These new capabilities will allow target tailoring to optimally couple to laser light to produce hot-and-dense plasma. You (and the rest of the team) will be responsible for the setup, execution, analysis, and interpretation of the experiments.

Qualifications
You have (or soon will have) a MSc physics or applied physics. Knowledge about fluid mechanics and/or experimental laser physics and/or (laser) spectroscopy is advantageous. Programming skills (Python) are welcomed. Good verbal and written communication skills (in English) are required.

Work environment
The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Dutch Research Council (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU), and associate partner the University of Groningen (UG), and the semiconductor equipment manufacturer ASML. ARCNL is located at the Amsterdam Science Park, The Netherlands, and has a size of approximately 100 scientists and support staff. See also www.arcnl.nl

Advanced semiconductor devices are produced using extreme ultraviolet (EUV) light at just 13.5nm wavelength. The recent revolutionary introduction of EUV lithography (EUVL) was the culmination of several decades of collaborative work between industry and science – a Project Apollo of the digital age. EUVL is powered by light that is produced in the interaction of high-energy CO2-gas laser pulses with molten tin microdroplets. The use of such lasers leads to low overall efficiency in converting electrical power to useful EUV light. Replacing gas lasers with much more efficient solid-state lasers may significantly improve efficiency, as well as output power. It is currently however unclear what laser wavelength, and what plasma ‘recipe’ should be used. This is because we lack understanding of the underlying complex physics. The goal of project MOORELIGHT is to deliver the missing insight.

Working conditions
The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of four years, with a starting salary of gross € 2,781 per month and a range of employment benefits. After successful completion of the PhD research a PhD degree will be granted at a Dutch University. Several courses are offered, specially developed for PhD-students. ARCNL assists any new foreign PhD-student with housing and visa applications and compensates their transport costs and furnishing expenses.

Besides the above mentioned conditions ARCNL offers:

• Responsibility over a setup including state-of-the-art droplet generators and laser system.
• The ability to improve your experimental skills in extensive experimental campaigns that can be designed with a lot of freedom.
• Collaboration with the in-house theory group, allowing you to develop a thorough understanding of the underlying target dynamics.
• A wide range of existing (image) data analysis tools, allowing you to apply and develop your data analysis skills.
• Cooperation within a large team of PhD students and postdoc and with a large industrial partner.

More information?
Dr. Oscar Versolato
Group leader EUV Plasma Processes
E-mail: versolato@arcnl.nl
Phone: +31 (0)20-851 7100

Application
Please send your:

• Resume
• Motivation letter on why you want to join the group (max. 1 page).

Online screening may be part of the selection.

Diversity code
ARCNL is highly committed to an inclusive and diverse work environment: we want to develop talent and creativity by bringing together people from different backgrounds and cultures. We recruit and select on the basis of competencies and talents. We strongly encourage anyone with the right qualifications to apply for the vacancy, regardless of age, gender, origin, sexual orientation or physical ability.

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