ResearchThe goal of this PhD project is to work towards a new paradigm of resist-free patterning of 2D materials such as MoS2 and WS2. 2D transition metal dichalcogenides (TMDs) will play a central role in scaling nanoelectronics beyond silicon limits. In order to integrate 2D TMDs in ultra-scaled CMOS devices, developing a patterning technology via state-of-the-art extreme ultraviolet (EUV) lithography is essential, however this comes with a new set of challenges related to the ultra-thin body of these layers.
In this pathfinding project, approaches for resist-free patterning will be developed by uniting area-selective processing technology and EUV lithography. Area-selective deposition (ASD), etching and modification of 2D TMDs will be achieved using state-of-the-art atomic layer deposition (ALD) and atomic layer etching (ALE) techniques. Please see for more information:
https://spie.org/advanced-lithography/presentation/Advanced-EUV-patterning-of-2D-TMDs-for-CMOS-integration/12956-47 and
https://pubs.acs.org/doi/10.1021/acs.chemmater.8b03454Project & Job descriptionWe are looking for a PhD student who is interested in performing experimental studies towards the development of resist-free patterning. A variety of experimental techniques will be employed to obtain insights into the growth and the surface chemistry such as in-situ ellipsometry and Fourier transform infrared spectroscopy. The impact of surface modification using EUV patterning and ALD/ALE will be studied for different materials. The experimental studies will be complemented with theoretical studies together with other project members. The project will be carried out in strong collaboration with ASML.
LocationThe work will be performed in the group Plasma & Materials Processing and in the NanoLab cleanroom at the Department of Applied Physics at the TU/e. The PMP group focuses on the advancement of the science and technology of plasma and materials processing, a research area which is in essence multidisciplinary and encompasses the research fields of plasma physics, surface science, and materials science. The scientific objective of the group is to obtain 'atomic' level understanding of the interaction of plasmas and gases with materials.